潘文霞（研究员）的个人简介
潘文霞，中科院力学研究所 研究员，博士生导师，工程科学部等离子体与材料工艺力学研究方向 责任研究员
简介：
1982年1月 西安交通大学机械工程系热处理专业学士
1982年10月 留学日本。
1988年9月在日本东京大学获工学博士学位，后在日本大阪大学、东京大学等单位工作
1996年 回国在北京科技大学做博士后
1997年 入选中国科学科院“百人计划”
1998年 到力学所工作
现在主要研究方向：
热等离子体的产生与状态控制、光谱与探针诊断，高温部分电离气体射流的稳定性与流场测量；
等离子体与材料表面的相互作用及换热效果，实验测量与理论分析；
等离子体表层材料制备与改性，包括热障涂层制备、抗热冲击性能检测、金属表面熔凝或熔敷强化工艺、薄膜沉积；
冷等离子体薄膜工艺。
过去主要从事过铸铁的离子渗氮、高频与直流叠加的热等离子体CVD法制备陶瓷纳米粉、低气压弧光等离子体烧结、等离子体喷涂、等离子体材料表面改性、金属与陶瓷的接合及其界面、热等离子体CVD制备大面积金刚石膜，以及直流大气压层流等离子体射流产生、磁扩弧等离子体发生器研制等方面的研究。
代表论著：
# W.X.Pan,, X.Meng, and C.K.Wu, “Laminar plasma jets: generation, characterization and applications for material surface processing”, Pure Appl. Chem., 77(2) 2005, 373-378.
# W.X.Pan, X.Meng, Q.X.Fei and C.K.Wu, “Feasibility of laminar plasma-jet hardening of cast iron surface”, Surface & Coatings Technology, (2005).
# G. Li, W.X.Pan, X.Meng and C.K.Wu, “Application of Similarity Theory to the Characterization of Non-transferred Laminar Plasma Generation”, Plasma Sources Sci. Technol., 14 (2005) 219-225.
# , W.X.Pan and C.K.Wu, “Preliminary Investigations on Low-Pressure Laminar Plasma Spray Processing”, Surface & Coatings Technology, 191(2005)166-174.
# W. X. Pan, W. H. Zhang, W. Ma and C. K. Wu，Characteristics of argon laminar DC plasma jet at atmospheric pressure，Plasma Chemistry and Plasma Processing, 22 [2], 271-283, 2002.
# W.X.Pan, W.H.Zhang, W.H.Zhang, and C.K.Wu, “Generation of Long, Laminar Plasma Jets at Atmospheric Pressure and Effects of Flow Turbulence”, Plasma Chemistry and Plasma Pro-cessing, 21(1),2001, 23-35.
# W.X.Pan, F., W.Z.Tang, G.F.Zhong, Z.Jiang and C.K.Wu, “Carbon transition efficiency and process cost in high-rate, large-area deposition of diamond films by DC arc plasma jet”, Diamond and Related Materials, 9, 1682-1686, 2000.
# W.X.Pan, T.Okamoto and X.S.Ning, “Joining of Al-plasma-sprayed Si3N4 ceramics”, J. Mater. Sci., 29, 1436-1440. (1994).
# W.X.Pan, T.Okamoto, Y.Miyamoto, X.S.Ning, H.Matsumoto and T.Yoshida, “Plasma spray deposition of fine SiC powder”, J. Am. Ceram. Soc., 76 [5] 1335-1339 (1993).
# W.X.Pan, H.Sato, T.Yoshida and K.Akashi, “Plasma sintering of ultrafine amorphous Si3N4”, Advaced Ceramic Materials (J. Am. Ceram. Soc.), 3[1] 77-79 (1988).
* W.X.Pan, W.H.Zhang, and C.K.Wu, “Generation and characterization of laminar-flow DC plasma jet at atmospheric pressure”, 5th Asia-Pacific Conf. On Plasma Sci. & Tech., Dalian, Sep. 10-13, 2000, pp.O-04, Invited topic.
* W. X. Pan and C. K. Wu，Vacuum plasma spray for high quality TBC，JSPS Inter. Symp. on Thermal Plasma Deposition, Tokyo , Jan. 28, 2002, ed. by T. Yoshida, etc., pp.29-35, Invited.
* W. X. Pan, G. Li, X. Meng, C. K. WU, “Laminar plasma jets: generation, characterization and applications for material surface processing”, In the proceedings of ISPC-16, Taormina, Italy, 2003, P. 247. (Invited)
* Wen-Xia Pan, Xian Meng, Kai Cheng, Dong-Yan Xu, Xi Chen, Cheng-Kang Wu. Flow field comparison of laminar and turbulent DC arc plasma jets. 7th Asia Pacific Conference on Plasma Science and Technology, June 29 u2013 July 2, 2004, Fukuoka, Japan. P. 67. (Abstract; Invited).
承担科研项目情况：
参见 工程科学研究部 等离子体与材料工艺力学组信息
